Micro-ultracapacitors with highly doped silicon nanowires electrodes

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Abstract

Highly n-doped silicon nanowires (SiNWs) with several lengths have been deposited via chemical vapor deposition on silicon substrate. These nanostructured silicon substrates have been used as electrodes to build symmetrical micro-ultracapacitors. These devices show a quasi-ideal capacitive behavior in organic electrolyte (1 M NEt4 BF4 in propylene carbonate). Their capacitance increases with the length of SiNWs on the electrode and has been improved up to 10 μFcm-2 by using 20 μm SiNWs, i.e., ≈10-fold bulk silicon capacitance. This device exhibits promising galvanostatic charge/discharge cycling stability with a maximum power density of 1.4 mW cm-2. © 2013 Thissandier et al.; licensee Springer.

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Thissandier, F., Pauc, N., Brousse, T., Gentile, P., & Sadki, S. (2013). Micro-ultracapacitors with highly doped silicon nanowires electrodes. Nanoscale Research Letters, 8(1), 1–5. https://doi.org/10.1186/1556-276X-8-38

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