Abstract
A new methodology to anchor λ-DNA to silanized n-Si(111) surface using Langmuir Blodget trough was developed. The n-Si (111) was silanized by treating it with low molecular weight octyltrichlorosilane in toluene. Scanning tunneling microscopy (STM) image of λ-DNA on octyltrichlorosilane deposited Si substrate shows areas exhibiting arrayed structures of 700 nm length and 40 nm spacing. Scanning tunneling spectroscopy (STS) at different stages depict a broad distribution of defect states in the bandgap region of n-Si(111) which presumably facilitates tunneling through otherwise insulating DNA layer. © Indian Academy of Sciences.
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Dey, S., Pethkar, S., Adyanthaya, S. D., Sastry, M., & Dharmadhikari, C. V. (2008). New approach towards imaging λ-DNA using scanning tunneling microscopy/spectroscopy (STM/STS). In Bulletin of Materials Science (Vol. 31, pp. 309–312). https://doi.org/10.1007/s12034-008-0049-6
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