Highly charged ion beams from the Tokyo EBIT for applications to nano-science and -technology

  • Tona M
  • Takahashi S
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Abstract

We report present status of a beam line for transportation of highly charged ions (HCIs) extracted from the Tokyo EBIT. We have produced continuous beams of 2.5 × 105 cps for Xe44+ through a 1 mm aperture. With slightly high energy operation (electron beam energy: 78 keV) of the Tokyo EBIT, we have also obtained 103 ions/pulse for Ta70+ HCIs extracted by a pulse mode (trapping time: 3 sec). We are going to apply such HCI beams to nano-processes on solid surfaces by utilizing some useful characteristics of the HCI-interactions. Future perspective of HCI-based nano-science and -technology is presented.

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Tona, M., & Takahashi, S. (2004). Highly charged ion beams from the Tokyo EBIT for applications to nano-science and -technology. Journal of Physics: Conference Series, 2, 57–64. https://doi.org/10.1088/1742-6596/2/1/008

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