Nitrogen K-edge EXAFS measurements on Mg-and Si-doped GaN

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Abstract

EXAFS measurements at the N K-edge are used to study the microstructure of n-and p-type GaN doped with Si and Mg, respectively. In undoped and Mg-doped GaN the nitrogen atom is four-fold coordinated with n (where 2.9

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Katsikini, M., Moustakas, T. D., & Paloura, E. C. (1999). Nitrogen K-edge EXAFS measurements on Mg-and Si-doped GaN. Journal of Synchrotron Radiation, 6(3), 555–557. https://doi.org/10.1107/S0909049598014423

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