Abstract
A tantalum-containing two-layer coating consisting of a 50 nm thick tantalum oxide sublayer and a tantalum layer up to 1200 nm thick has been produced by DC-magnetron sputtering. On the surface of the coating grains, disoriented lamellar formations with an average size of 46 ± 1 nm were found, the hardness of which was characterized by a bimodal distribution. The proportion of superhard inclusions with H = 76.19 ± 9.64 GPa was no <55.6%.
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Shumilin, A. I., & Fomin, A. A. (2023). Tantalum-containing coatings with superhard inclusions produced by DC-magnetron sputtering. International Journal of Refractory Metals and Hard Materials, 112. https://doi.org/10.1016/j.ijrmhm.2023.106133
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