(Zn,Cu)O Films by Atomic Layer Deposition - Structural, Optical and Electric Properties

Abstract

ZnCuO thin lms have been deposited on silicon, glass and quartz substrates by atomic layer deposition method, using reactive organic precursors of zinc and copper. As zinc and copper precursors we applied diethylzinc and copper(II) acetyloacetonate. Structural, electrical and optical properties of the obtained ZnCuO layers are discussed based on the results of scanning electron microscopy, energy dispersive spectroscopy, X-ray di raction, atomic force microscopy, the Hall e ect and photoluminescence investigations