Abstract
We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale. © 2008 American Institute of Physics.
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CITATION STYLE
Gomila, G., Toset, J., & Fumagalli, L. (2008). Nanoscale capacitance microscopy of thin dielectric films. Journal of Applied Physics, 104(2). https://doi.org/10.1063/1.2957069
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