Impact of Substrate Temperatures on the Properties of V2O5Thin Films Deposited by Pulsed Laser Deposition

Abstract

Vanadium pentoxide (V2O5) thin films were fabricated by pulsed laser deposition (PLD) on fused silica substrate at temperatures (Ts) ranged from ambient temperature up to 300°C. UV-VIS-NIR spectral measurements, X-ray diffraction (XRD) X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) were made to understand the influence of substrate temperature on optical, structural, and compositional properties. The substrate temperature displayed a robust effect on the construction and visual characteristics. The photosensitive band gap of PLD V2O5 films was powerfully dependent on the substrate temperature and was reduced from 2.36 eV to 2.08 eV with the growth of substrate temperature from ambient temperature to 300°C. However, the refractive index showed an increase from 2.28 to 2.69 for the same temperature range. V2O5 films grown at Ts = 300°C exhibited a crystalline nature as evidenced by XRD and SEM studies. The chemical composition of V2O5 films has been studied by XPS and the data revealed pure V2O5 compound was formed.