Abstract
The techniques of optical emission spectroscopy with actinome-try, laser induced fluorescence spectroscopy, laser optogalvanic spectroscopy and absorption spectroscopy are discussed. Examples of the application of these techniques to probing low pressure plasmas of the type used in microelectronics materials processing are presented. © 1985 IUPAC
Cite
CITATION STYLE
APA
Dreyfus, R. W., Jasinski, J. M., Walkup, R. E., & Selwyn, G. S. (1985). Optical diagnostics of low pressure plasmas. Pure and Applied Chemistry, 57(9), 1265–1276. https://doi.org/10.1351/pac198557091265
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.
Already have an account? Sign in
Sign up for free