Formation of boron-based films and boron nitride layers by CVD of a boron ester

Abstract

(Figure Presented) Directing films: The chemical vapor deposition of (MeO)3B on a multilayered Rh(111) substrate results in selective precursor decomposition leading to a boride-type film. This film can be oxidized into a well-ordered boron nitride monolayer (see picture with model structure), thus opening up a new approach to BN systems. © 2011 Wiley-VCH Verlag GmbH & Co. KGaA.