Abstract
The validity of a widely used simple closed-form expression for the recombination associated with dangling bonds in hydrogenated amorphous silicon (a -Si:H) is linked to the relative position of the distribution of the dangling bond states with respect to the quasi-Fermi levels for trapped electrons and holes. However, these quasi-Fermi levels for traps have not been derived before. In this work, we derive the four relevant quasi-Fermi levels for traps associated with dangling bonds in a -Si:H and clarify the limitations of the simple model. © 2008 American Institute of Physics.
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CITATION STYLE
Li, T. T. A., McIntosh, K. R., & Cuevas, A. (2008). Limitations of a simplified dangling bond recombination model for a -Si:H. Journal of Applied Physics, 104(11). https://doi.org/10.1063/1.3037235
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