A novel approach for doping impurity in thin film insitu by dual-beam pulsed-laser deposition

Abstract

Doping techniques are of great importance in developing new materials and devices. We present here a novel approach for doping impurity in thin film by using dual-beam pulsed-laser deposition technique that allows insitu controlling doping under a wide range of conditions. We demonstrated doping Ag insitu in YBa2Cu3O7-δ thin films and for the first time observed long bar-like Ag structures with a length up to 150 μm in the as-deposited films, which may have important application in the fabrication of superconductor-normal metal-superconductor Josephson junctions. © 1998 American Institute of Physics.