Measurement of film thickness up to several hundreds of nanometers using optical waveguide lightmode spectroscopy

Abstract

Up to now, most studies based on optical waveguide lightmode spectroscopy (OWLS) were dedicated to thin adlayers, assumed to be isotropic and homogeneous, for which data analysis was based on an approximation of the mode equations valid when the thickness is small with respect to the wavelength of the laser light. The aim of the present paper is to extend the use of OWLS to thicker deposited layers (up to ≈400 nm). Both the simplified and extended models are compared in terms of optical parameters, i.e. the refractive index n A, the thickness dA, and the optical mass QA, for experimental data obtained with polyelectrolyte multilayer films. The deviation of these parameters can be quite large when derived using the simplified model instead of the extended model. This observation evidences that OWLS is well suited for the study of "thick" films if the appropriate model is applied to the data analysis. © 2004 Elsevier B.V. All rights reserved.