Abstract
The Na0.5 Co0.9 Cu0.1 O2 thick film with the same thermoelectric performance as a Na0.5 CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2 m, with the resistivity of 3.8 mΩcm and the thermopower of 108 µV/K. The thick film without any cracks strongly adhered to the substrate. The high-quality thick film had been realized through the carefully designed and improved process, mixing NaCl to promote the anisotropic sintering of Na0.5 Co0.9 Cu0.1 O2, inserting a CuO interlayer to adhere the film and substrate, and Co–Cu substituting Cu for Co to control the sintering temperature.
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Tsuruta, A., Tanaka, M., Mikami, M., Kinemuchi, Y., Masuda, Y., Shin, W., & Terasaki, I. (2020). Development of na0.5 coo2 thick film prepared by screen-printing process. Materials, 13(12), 1–11. https://doi.org/10.3390/ma13122805
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