Effects of carbon on ion-implantation-induced disorder in GaN

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Abstract

Wurtzite GaN films bombarded with 40 keV C ions to high doses (5× 1017 and 1× 1018 cm-2) are studied by a combination of Rutherford backscattering/channeling spectrometry, transmission electron microscopy, and soft x-ray absorption spectroscopy. Results show that, contrary to other ion species, implanted C forms nitrilelike carbon-nitride bonds (CN) and suppresses ion-beam-induced material decomposition involving the formation and agglomeration of 5-nm -large N2 gas bubbles. © 2007 American Institute of Physics.

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Kucheyev, S. O., Bradby, J. E., Li, C. P., Ruffell, S., Van Buuren, T., & Felter, T. E. (2007). Effects of carbon on ion-implantation-induced disorder in GaN. Applied Physics Letters, 91(26). https://doi.org/10.1063/1.2827587

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