Abstract
Solid-solution Nb-O films containing up to 50 atom % oxygen, prepared by magnetron sputtering, were used to investigate the influence of the oxygen on field crystallization during anodizing at 100 V in 0.1 mol dm-3 ammonium pentaborate electrolyte at 333 K. The findings reveal that field crystallization is hindered dramatically by addition of 20 atom % oxygen to the substrate, while no crystallization occurs for a Nb-50 atom % O substrate. Prior thermal treatment accelerates field crystallization of niobium, but not the Nb-50 atom % O substrate. The thermal treatment is considered to promote generation of precursor sites for crystal nucleation. However, sufficient oxygen in the substrate may restrict precursor development and/or reduce the compressive stresses in the amorphous anodic niobia that can facilitate crystal growth. © 2006 The Electrochemical Society. All rights reserved.
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CITATION STYLE
Habazaki, H., Ogasawara, T., Konno, H., Shimizu, K., Nagata, S., Asami, K., … Thompson, G. E. (2006). Suppression of Field Crystallization of Anodic Niobia by Oxygen. Journal of The Electrochemical Society, 153(5), B173. https://doi.org/10.1149/1.2184909
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