Abstract
The H- negative ion thermal energy measured using the two-laser-pulse photodetachment technique is reported to be in the range from 0.1 to 0.7 eV for various conditions of volume ion source operation (pressure-from 2 to 7 mTorr, discharge current-from 1.5 to 20 A). The hydrogen pressure has a significant effect in lowering the negative ion temperature, while the increase of the discharge current leads to a rise in T-. It is found that T- is a fraction of the electron temperature, T e. This fraction is strongly dependent on the gas pressure. T - scales linearly with the electron temperature and exceeds the highest values predicted by the theory of dissociative attachment. The possible mechanisms for H- ion heating are discussed.
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CITATION STYLE
Bacal, M., Berlemont, P., Bruneteau, A. M., Leroy, R., & Stern, R. A. (1991). Measurement of the H- thermal energy in a volume ion source plasma. Journal of Applied Physics, 70(3), 1212–1219. https://doi.org/10.1063/1.349575
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