Coalescence as a key process in wafer-scale diamond heteroepitaxy

Abstract

Due to fascinating physical properties powered by remarkable progress in chemical vapor deposition of high-quality epilayers, diamond thin films attract great attention for fabrication of nitrogen-vacancy-based solid-state spin systems capable of operating in ambient conditions. To date, diamond heteroepitaxy via bias-enhanced nucleation is an unavoidable method for reliable wafer-scale film manufacturing. In this work, we analyze the coalescence phenomena in nitrogen doped, heteroepitaxial diamond epilayers, with a particular focus on their specific role in the annihilation of macroscopic crystal irregularities such as grain boundaries, non-oriented grains, and twinned segments. Here, we also report on the growth mechanism for the “primary” crystal orientation along with a predominant formation of two different types of boundaries highlighting the {011}-type as a main source of the crystal lattice irregularities.