Abstract
The complex dielectric function ∈ and the E0 excitonic and band-edge critical-point structures of hexagonal GaN are reported for temperatures from 30 to 690 K and energies from 0.74 to 6.42 eV, obtained by rotating-compensator spectroscopic ellipsometry on a 1.9 μm thick GaN film deposited on a c-plane (0001) sapphire substrate by molecular beam epitaxy. Direct inversion and B-splines in a multilayer-structure calculation were used to extract the optical properties of the film from the measured pseudodielectric function 〈∈〉. At low temperature sharp E0 excitonic and critical-point interband transitions are separately observed. Their temperature dependences were determined by fitting the data to the empirical Varshni relation and the phenomenological expression that contains the Bose-Einstein statistical factor. © 2014 Author(s).
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CITATION STYLE
Kim, T. J., Hwang, S. Y., Byun, J. S., Barange, N. S., Park, H. G., & Dong Kim, Y. (2014). Temperature dependent dielectric function and the e 0 critical points of hexagonal GaN from 30 to 690 K. AIP Advances, 4(2). https://doi.org/10.1063/1.4867094
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