Abstract
Large fluctuations of key parameters in cation-based resistive random access memory (RRAM), which originate from stochastic growth of metallic conductive filaments, always impose a significant barrier to the practical application of memory devices. Here, we propose an ordinary bilayer oxide structure of Ag/TaOx/TaOy/Pt (x
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CITATION STYLE
APA
Sun, Y. M., Song, C., Yin, J., Qiao, L. L., Wang, R., Wang, Z. Y., … Pan, F. (2019). Modulating metallic conductive filaments via bilayer oxides in resistive switching memory. Applied Physics Letters, 114(19). https://doi.org/10.1063/1.5098382
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