Growth Kinetics of Thin Film Epitaxy

Abstract

This chapter mainly introduces five basic stages of the film deposition process (vapor adsorption, surface diffusion, reaction between adsorbed species, reaction of film materials to form bonding surface, and nucleation and microstructure formation), analyzes the influence of deposition process parameters on the three basic growth modes of the film, focuses on the relationship between the control parameters of homoepitaxy and heteroepitaxy and the film structure, gives the dynamic characteristics of each growth stage, and examines the factors determining epitaxy film structure, topography, interfacial properties, and stress. It is shown that two-dimensional nucleation is a key to obtain high-quality epitaxial films.