Abstract
The authors have previously reported the use of surfactants in the etching solutions used to polish SC-, AT-, and Z-cut crystals. The surfactants made the chemical polishing of AT- and SC-cuts virtually foolproof, although the Z-cut's polishing remained critically dependent on the cleanliness of the surfaces prior to etching at 75 degree C. Work on simplifying these polishing procedures through the use of surfactants has been extended to AK-, ST-, and BT-cuts. It has been found the AK-, ST-, and BT-cuts exhibit low contamination sensitivity compared to the SC- and Z-cuts. Also, it has been found to be significantly easier to polish Z-cut crystals at 40 degree C than at 75 degree C.
Cite
CITATION STYLE
Brandmayr, R. J., & Vig, J. R. (1986). FURTHER RESULTS ON THE USE OF SURFACTANTS IN CHEMICALLY POLISHING QUARTZ CRYSTALS. In Proceedings of the Annual IEEE International Frequency Control Symposium (pp. 86–90). IEEE. https://doi.org/10.1109/freq.1986.200926
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