Nonvolatile resistive switching in Pt/laALO3/srTiO3 heterostructures

122Citations
Citations of this article
86Readers
Mendeley users who have this article in their library.

Abstract

Resistive switching heterojunctions, which are promising for nonvolatile memory applications, usually share a capacitorlike metal-oxide-metal configuration. Here, we report on the nonvolatile resistive switching in Pt/LaAlO3/SrTiO3 heterostructures, where the conducting layer near the LaAlO3/SrTiO3 interface serves as the "unconventional"bottom electrode although both oxides are band insulators. Interestingly, the switching between low-resistance and high-resistance states is accompanied by reversible transitions between tunneling and Ohmic characteristics in the current transport perpendicular to the planes of the heterojunctions. We propose that the observed resistive switching is likely caused by the electric-field-induced drift of charged oxygen vacancies across the LaAlO3/SrTiO3 interface and the creation of defect-induced gap states within the ultrathin LaAlO3 layer. These metal-oxide-oxide heterojunctions with atomically smooth interfaces and defect-controlled transport provide a platform for the development of nonvolatile oxide nanoelectronics that integrate logic and memory devices.

Cite

CITATION STYLE

APA

Wu, S., Luo, X., Turner, S., Peng, H., Lin, W., Ding, J., … Wu, T. (2014). Nonvolatile resistive switching in Pt/laALO3/srTiO3 heterostructures. Physical Review X, 3(4). https://doi.org/10.1103/PhysRevX.3.041027

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free