We contribute here a theoretical study of the electron mobility in n-doped GaN, InN, and AlN at moderate to high electric fields. We solve the set of coupled nonlinear integro-differential equations of evolution to obtain the steady-state values of the basic intensive nonequilibrium thermodynamic variables for the three materials. The regions with ohmic and non-ohmic behavior in the electron drift velocity dependence on the electric field strength are characterized in the three nitrides. The electron mobility is calculated, and it is shown that the larger corresponds to InN, and the smaller to AlN.
CITATION STYLE
Rodrigues, C. G., Freire, V. N., Vasconcellos, Á. R., & Luzzi, R. (2002). Electron mobility in nitride materials. In Brazilian Journal of Physics (Vol. 32, pp. 439–441). Sociedade Brasileira de Fisica. https://doi.org/10.1590/S0103-97332002000200056
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