Using focused electron beams to drill straight nanopores on a membrane

Abstract

A high-resolution focused electron beam is used for the fabrication of metal nanostructures and devices with insulating membranes by nanosculpting metal films. This top-down focused electron beam drilling method uses the controlled ablation of materials to produce nanoscale devices with near-atomic precision of order. Using the proposed procedure, nano-drilling is not directly realized through the aperture, but by using a focused electron beam to burn away the solvent. Recent studies have investigated silicon nitride nanopores with an hourglass profile and silica nanopores with a pyramid-shaped cross-section, but electronic drilling in these approaches failed to produce straight nanopores. A method is proposed to improve the membranes' thermal conductivity to rapidly produce straight nanopores, and is experimentally confirmed and has significant potential for use in nano-sensors or nano-devices.