Removing process of the three-dimension periodic nanostructure fabricated from KMPR photoresist

Abstract

Three-dimensional (3D) periodic nanostructures with photonic and phononic crystals have enormous potential for new technology and research for example energy science, microfluidics and semiconductors. Previous studies have focused on using high pressure, high temperature and high cost processes like chemical vapor deposition or physical vapor deposition. In this work, 3D nanostructures were fabricated through a simple and cost effective method called the proximity field nano-patterning (PnP) process. Previous research has shown that 3D nanostructures can be fabricated via a PnP process using an SU-8 resist. Our research uses a KMPR (MicroChem) negative photoresist, which can be processed through an aqueous developer and removed by solution process. We investigated the Talbot distance, height, and periodicity of the KMPR periodic 3D nanostructure versus the SU-8 3D nanostructure. Furthermore, we demonstrate a facile solution removal process for the resist to fabricate inverse 3D nanostructures which can be extended to many applications.