Abstract
In this work we present the developed experimental technique as well as results of optical control of adsorption processes during thin film deposition. Different metallic films:(silver) as a model material and barium getter films were studied. Thermal evaporation method has been used to deposit thin metallic films and films of barium getter on glass substrates. Kinetics of the optical absorbance of the growing film was registered in situ measuring transmission of the film-substrate structure. These measurements were done in parallel to the ex-situ absorption (UV-VIS) and reflection spectra as well as XRD analysis. Such complex measurements enabled us to follow adsorption process from the residual gases during thermal evaporation as well to control adsorption process after the evaporation. © 2008 IOP Publishing Ltd.
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CITATION STYLE
Giedraitis, A., Tamulevicius, S., Slapikas, K., Gudaitis, R., & Juraitis, A. (2008). In situ analysis of adsorption process from residual gases during thin film deposition. Journal of Physics: Conference Series, 100(PART 9). https://doi.org/10.1088/1742-6596/100/9/092026
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