Characterization of near-field optical microscope probes

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Abstract

In this article the far-field radiation analysis of near-field optical probes is presented. It is shown that the quality of probes used for near-field scanning microscopy imaging can be estimated using directional measurements of the far-field radiation patterns. Experimental results are compared with numerical modeling of far-field radiation performed using finite difference in time-domain method (FDTD) and with SEM characterization of real probe geometry. The effects of probe geometry on real measurement on different samples are studied as well. Copyright © 2008 John Wiley & Sons, Ltd.

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Klapetek, P., Valtr, M., Klenovský, P., & Buršík, J. (2008). Characterization of near-field optical microscope probes. In Surface and Interface Analysis (Vol. 40, pp. 482–485). https://doi.org/10.1002/sia.2784

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