A robust SEM auto-focus algorithm using multiple band-pass filters

Abstract

An auto-focus algorithm using multiple band-pass filters for a scanning electron microscope (SEM) is proposed. To acquire sharp images of various kinds of defects by SEM defect observation in semiconductor manufacturing, the auto-focus process must be robust. A method for designing a band-pass filter for calculating the 'focus measure' (a key parameter of the auto-focus process) is proposed. To achieve an optimal specific frequency response for various images, multiple band-pass filters are introduced. As for the proposed method, two series of focus measures are calculated by using multiple band-pass filters independently, and it is selected according to reliability of the series of focus measures. The signal-to-noise ratio of an image for acceptable auto-focus precision is determined by simulation using pseudo images. In an experiment using the proposed method with real images, the success rate of auto focus is improved from 79.4% to 95.6%.