Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy

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Abstract

We perform scanning tunnelling microscopy (STM) in a regime where primary electrons are field-emitted from the tip and excite secondary electrons out of the target-The scanning field-emission microscopy regime (SFM). In the SFM mode, a secondaryelectron contrast as high as 30% is observed when imaging a monoatomic step between a clean W(110)-and an Fe-covered W(110)-Terrace. This is a figure of contrast comparable to STM. The apparent width of the monoatomic step attains the 1 nm mark, i.e. it is only marginally worse than the corresponding width observed in STM. The origin of the unexpected strong contrast in SFM is the material dependence of the secondary-electron yield and not the dependence of the transported current on the tip-target distance, typical of STM: accordingly, we expect that a technology combining STM and SFM will highlight complementary aspects of a surface while simultaneously making electrons, selected with nanometre spatial precision, available to a macroscopic environment for further processing.

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Zanin, D. A., De Pietro, L. G., Peter, Q., Kostanyan, A., Cabrera, H., Vindigni, A., … Ramsperger, U. (2016). Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy. Proceedings of the Royal Society A: Mathematical, Physical and Engineering Sciences, 472(2195). https://doi.org/10.1098/rspa.2016.0475

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