Low-Temperature naturatron sputtering system for deposition of indium tin oxide film

Abstract

In this paper, we have newly developed a metal thin film-forming sputtering system using the Naturatron Sputtering method that can prevent the plastic film from suffering damage caused by the high-energy particles in plasma and carry out the low-temperature high-density metal deposition with a sputtering chamber and a film deposition chamber separated from each other. This system has made it possible to deposit the indium tin oxide (ITO) thin film on the poly(ethylene naphthalate) film as a substrate. As a result of energy-dispersive X-ray spectroscopy analysis or scanning electron microscope analysis performed for the ITO thin film, it has been proven that the uniform-surface ITO thin film can be deposited on a plastic film.