A Novel EMD-1DCNN Framework for Recognizing Concurrent Control Chart Patterns in Autocorrelated Processes

Abstract

Control chart pattern recognition was initially focused on single patterns with the assumption of normal, independent, and identical distribution. In practice, though, these assumptions are rarely valid in manufacturing processes, due to numerous influencing factors and short intervals in data collecting. It is necessary to consider that the inherent disturbance is autocorrelated and that two single patterns appear at the same time. This study presents a novel framework integrating Empirical Mode Decomposition (EMD) and one-dimensional Convolutional Neural Networks (1DCNN) with feature component selection for recognizing concurrent control chart patterns in autocorrelated manufacturing processes. We assume the inherent disturbance follows a first-order autoregressive (AR (1)) process and simulate eleven concurrent patterns. Then, the EMD method decomposes the concurrent pattern into a series of feature components, wherein the correlation coefficient is employed as the index by which to select the two feature components. Finally, the selected feature components and raw data are combined to create a feature vector that acts as the input for the 1DCNN model. The simulation results demonstrate that the proposed model achieves a recognition accuracy of 92.39%, outperforming both the singular spectrum analysis–support vector machine (SSA-SVM) and the singular spectrum analysis–random forest (SSA-RF) methods in terms of accuracy and robustness.