The High Energy diffraction beamline at the Canadian Light Source

Abstract

The design, performance, and capabilities of the High Energy beamline at the Brockhouse Sector of the Canadian Light Source are described. The beamline uses a single bent silicon wafer as a side-bounce Laue monochromator, using the (111), (422), or (533) hkl reflections to access energies ranging from 25 to 90 keV. The cryogenically cooled crystal serves as the only optical element in the beamline providing a simple, convenient, and reliable configuration. The bending provides a vertical focus as small as 20 μm. The flux ranges from 1 × 1010 to 1 × 1013 photons s-1, depending on the energy, with typical pre-monochromator slit settings. A large translation table in the hutch moves to follow the beam as the energy is changed. Data are collected using large area detectors. Common uses include rapid collection of powder diffraction data, penetration of thick samples and devices, high pressure diffraction, and pair distribution function measurements.