The diffusion of Fe3+ in amorphous SiO2 and the protective properties of SiO2 layers

Abstract

The chemical diffusion coefficient of 55Fe3+ in synthetic SiO2 glass has been measured in the temperature range 500-1000°C at an oxygen pressure of 1 atm. The diffusion coefficient is given by DFe3+ = 6 × 10-3 exp {-3(eV) kT}cm22s-1. The data indicate that continuous SiO2 films should be extremely effective in reducing the oxidation rate of ferrous alloys in this temperature range. © 1981.