Deposição de filmes finos de nitreto de titânio em plasma com efeito de comprimento de catodo oco em gaiola catódica

Abstract

The use of cathodic cage contributes for thin and thick films deposition on glass substrate or over metal substrates. There are many possibilities in using this technique. Into this work, the discharge of plasma on cathodic cage was used for titanium nitrite films deposition on glass substrate. The aim was to compare the films properties with use of two different thicknesses of cover cages. The films characterization were made using X-Ray diffraction analysis, thickness measurements by reflectometry, electrical resistivity measurements, transmittance and images of surfaces by scanning electron microscopy and analysis of composition by EDS. Reflectometry analysis had showed that deposition rate and surface films roughness had increased with use of a thicker cover cage (10 mm of thickness). The film deposited in the atmosphere containing 155 sccm of N2 95 sccm of H2 and pressure of 0.5 Torr had showed low transmittance in the region of the red and near infrared, indicating the use as IR filter.