Abstract
In order to obtain a large deflection angle without increasing the applied voltage to an electron biprism, we have developed a 'twin-electron biprism' (TBP), which is composed of two filament electrodes and a pair of ground plates. The observed interference-fringe spacing revealed that the deflection angle created by a TBP was about twice larger than that by a 'conventional electron biprism'. Also, we have suggested, in a double-electron biprism interferometry, the optimal disposition of a TBP for reducing the intensity of Fresnel fringes recorded in an electron hologram. © The Author 2011. Published by Oxford University Press [on behalf of Japanese Society of Microscopy]. All rights reserved.
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Ikeda, M., Sugawara, A., & Harada, K. (2011). Twin-electron biprism. Journal of Electron Microscopy, 60(6), 353–358. https://doi.org/10.1093/jmicro/dfr071
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