Low Beam Energy SEM

  • Goldstein J
  • Newbury D
  • Michael J
  • et al.
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Abstract

The incident beam energy is one of the most useful parameters over which the microscopist has control because it determines the lateral and depth sampling of the specimen properties by the critical imaging signals. The Kanaya–Okayama electron range varies strongly with the incident beam energy:$$ {R}_{K-O}(nm)=\left(27.6\ A/{Z}^{0.89}\rho \right){E_0}^{1.67} $$where A is the atomic weight (g/mol), Z is the atomic number, ρ is the density (g/cm3), and E0 (keV) is the incident beam energy, which is shown graphically in Fig. 11.1a–c.

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Goldstein, J. I., Newbury, D. E., Michael, J. R., Ritchie, N. W. M., Scott, J. H. J., & Joy, D. C. (2018). Low Beam Energy SEM. In Scanning Electron Microscopy and X-Ray Microanalysis (pp. 165–172). Springer New York. https://doi.org/10.1007/978-1-4939-6676-9_11

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