Abstract
We report on the fabrication and characterization of Al0.1Ga0.9N/GaN heterojunction field effect transistors, both an enhancement mode and a depletion mode with a low pinchoff voltage, suitable for digital integrated circuit applications. For an enhancement mode device with a 1 μm gate length and 5 μm drain-to-source separation, the dc transconductance is around 23 mS/mm. Connecting the enhancement mode device as a switching transistor and a depletion mode device as a load, we demonstrate an AlGaN/GaN inverter. © 1996 American Institute of Physics.
Cite
CITATION STYLE
Khan, M. A., Chen, Q., Sun, C. J., Yang, J. W., Blasingame, M., Shur, M. S., & Park, H. (1996). Enhancement and depletion mode GaN/AlGaN heterostructure field effect transistors. Applied Physics Letters, 68(4), 514–516. https://doi.org/10.1063/1.116384
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