The effect of pressure for ashing process by using hollow cathode oxygen plasma

Abstract

The oxygen plasma has employed to remove the coating material in the surface of the substrate. The plasma parameter such as pressure has a role in the removing process. The pressure supplies a lot of gas inside the chamber. The quantity of gas pressure affects in the plasma density during the plasma generation. The pressure has varied in the range 50 to 110âPa. Moreover, the hollow cathode plasma system has employed to make ashing process. The hollow cathode plasma system provides the new way to restrain the movement of electron and ion density. The hollow cathode system increases the presentation of ionization process of the plasma. The Langmuir probe has utilized for measuring ion density. The ion density has measured in the range 5 × 1017 to 1.5 × 1018 m-3 from the system. The high ion density has employed to remove the diamond coating in the surface of milling tools. The plasma ashing result indicates the diamond coating has removed from the surface of milling tool for 3.6ks. The SEM image also indicates the fine surface of cutting tool after ashing process. The fine surface indicates there is no damage from the ion and electron bombardment during ashing process.