X-ray microscopy greatly benefits from the advances in X-ray optics. At the Paul Scherrer Institut, developments in X-ray diffractive optics include the manufacture and optimization of Fresnel zone plates (FZPs) and diffractive optical elements for both soft and hard X-ray regimes. In particular, we demonstrate here a novel method for the production of ultra-high resolution FZPs. This technique is based on the deposition of a zone plate material (iridium) onto the sidewalls of a prepatterned template structure (silicon) by atomic layer deposition. This approach overcomes the limitations due to electron-beam writing of dense patterns in FZP fabrication and provides a clear route to push the resolution into sub-10 nm regime. A FZP fabricated by this method was used to resolve test structures with 12 nm lines and spaces at the scanning transmission X-ray microscope of the PolLux beamline of the Swiss Light Source at 1.2 keV photon energy. © 2009 IOP Publishing Ltd.
CITATION STYLE
Vila-Comamala, J., Jefimovs, K., Pilvi, T., Ritala, M., Sarkar, S. S., Solak, H. H., … David, C. (2009). Advanced X-ray diffractive optics. In Journal of Physics: Conference Series (Vol. 186). https://doi.org/10.1088/1742-6596/186/1/012078
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