Data preparation

2Citations
Citations of this article
127Readers
Mendeley users who have this article in their library.
Get full text

Abstract

After the successful completion of an integrated circuit (IC) design, the production phase of an IC can be started. To make the production of ICs possible, the photolithographic imaging process of the wafers needs masks. This chapter covers data preparation for the manufacturing of these masks. It first describes the general flow followed by some trends that can be observed in this area. There is another section on the quality impact of mask data on the final mask.

Cite

CITATION STYLE

APA

van Adrichem, P. J. M., & Kalus, C. K. (2005). Data preparation. In Handbook of Photomask Manufacturing Technology (pp. 19–42). CRC Press. https://doi.org/10.1145/3444831.3444835

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free