Abstract
After the successful completion of an integrated circuit (IC) design, the production phase of an IC can be started. To make the production of ICs possible, the photolithographic imaging process of the wafers needs masks. This chapter covers data preparation for the manufacturing of these masks. It first describes the general flow followed by some trends that can be observed in this area. There is another section on the quality impact of mask data on the final mask.
Cite
CITATION STYLE
van Adrichem, P. J. M., & Kalus, C. K. (2005). Data preparation. In Handbook of Photomask Manufacturing Technology (pp. 19–42). CRC Press. https://doi.org/10.1145/3444831.3444835
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