Lanthanide N,N-dimethylaminodiboranates: Highly volatile precursors for the deposition of lanthanide-containing thin films

46Citations
Citations of this article
17Readers
Mendeley users who have this article in their library.
Get full text

Abstract

(Figure Presented) New lanthanide CVD precursors of stoichiometry Ln(H 3BNMe2BH3)3 have been prepared, where Ln = La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, and Lu. The ligand is N,N-dimethylaminodiboranate, a new kind of multidentate borohydride. The structures of the Ln(H3BNMe2BH3)3 complexes are highly dependent on the size of the lanthanide ions: the coordination number decreases from Pr (CN = 14) to Sm (CN = 13) to Er (CN = 12) corresponding with the decrease in ionic radii. The Ln(H3BNMe2BH3)3 complexes are highly volatile and sublime at temperatures as low as 65 °C in vacuum. These complexes are useful CVD precursors; for example, Y(H3BNMe 2BH3)3 has been used to deposit Y2O3 on silicon at 300 °C by CVD using water as a coreactant. Copyright © 2010 American Chemical Society.

Cite

CITATION STYLE

APA

Daly, S. R., Kim, D. Y., Yang, Y., Abelson, J. R., & Girolami, G. S. (2010). Lanthanide N,N-dimethylaminodiboranates: Highly volatile precursors for the deposition of lanthanide-containing thin films. Journal of the American Chemical Society, 132(7), 2106–2107. https://doi.org/10.1021/ja9098005

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free