A solution-processed air-stable perylene diimide derivative for N-type organic thin film transistors

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Abstract

For future all-soluble organic thin film transistor (OTFT) applications, a new soluble n-type air-stable perylene diimide derivative semiconductor material with (trifluoromethyl)benzyl groups (TC-PDI-F) is synthesized. The film is formed by spin-coating in air and optimized for OTFT fabrications. The transistor characteristics and air-stability of the TC-PDI-F OTFTs is measured to investigate the feasibility of using solution-processed TC-PDI-F for future OTFT applications. For all-solution OTFT process applications, the transistor characteristics are demonstrated by using TC-PDI-F as an n-type semiconductor material and liquid-phase-deposited SiO2 (LPD-SiO2) as a gate dielectric material. All processes (except material synthesis and electrode deposition) and electrical measurements are conducted in air. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Ting, H. W., Chen, S. Y., Huang, T. C., Wei, J. H., & Yew, T. R. (2011). A solution-processed air-stable perylene diimide derivative for N-type organic thin film transistors. ChemPhysChem, 12(4), 871–877. https://doi.org/10.1002/cphc.201000241

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