Micro-material handling employing e-beam generated topographies of copper and aluminium

Abstract

This paper focuses on the employment of copper and aluminium in a micro-material handling system actuated by Van der Waals forces. Electron beam (e-beam) evaporator deposited both materials on a silicon substrate at a rate of 0.6-1.2 Angstroms/second, vacuum pressure between 2×10-6 and 3×10-6mbar, and at a current less than 10mA. A Veeco NanoMan V Atomic Force Microscope with Nanoscope version 7.3 software was used to analyse the root mean square (rms) surface roughnesses of the generated topographies. Rumpf-Rabinovich's rms formula was used to determine the Van der Waals forces exerted by the surfaces. It was synthesised that an e-beam deposition of 7 minutes' duration on both materials produced an optimum micro-material handling solution, with copper suitable for the pick-up position and aluminium for the placement position.