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BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

Journal of Physics: Conference Series (2017) 857(1)
DOI: 10.1088/1742-6596/857/1/012017
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Abstract

Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 μs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.

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APA

Kamenetskikh, A. S., Gavrilov, N. V., Koryakova, O. V., & Cholakh, S. O. (2017). BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma. In Journal of Physics: Conference Series (Vol. 857). Institute of Physics Publishing. https://doi.org/10.1088/1742-6596/857/1/012017

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