Effectivity of uv-light exposure on bacterial and fungal growth in Channa striata collagen-chitosan composite dressing for wound healing

Abstract

Introduction: Channa striata collagen-chitosan wound dressing (3:1 v/v) was founded contaminate by bacterial and fungal. Therefore, to suppress bacterial and fungal contamination in Channa striata collagen-chitosan composite dressing, it needs several efforts such as sterilization under Ultra-Violet Light Exposure. The study aimed to determine UV-light exposure duration to supress bacterial and fungal growth on C. striata collagen-chitosan composite dressing. Methods: C. striata collagen was extracted from skin and scales using 2% HCl for 48 hours, then neutralized using NaOH 1 M until collagen fibers appeared. Chitosan powder dissolved in 2% acetic acid. Afterward C. striata collagen and chitosan liquid (1:3 v/v) were mixed and formed until wound dressing was reached. Wound dressing was sterilized under UV exposure for 0, 5, 10, 15, and 30 minutes. Chitosan dressing was used as a negative control. Results: The results of the study showed that the total number of bacteria and fungi decreased significantly with increasing time of exposure of UV light on composites dressing with a value of p=0.001 for bacterial growth and a value of p= 0.005 for fungus growth. The UV exposure on collagen-chitosan dressing to reduce bacterial and fungal growth proved effective in 10 minutes. Conclusions: The UV light exposure treatment can reduce bacterial and fungal contamination on collagen-chitosan composites on each addition duration exposure descriptively.