Abstract
Moth-eye structure (MES), biologically antireflective structure, can be regarded as an impedance-matching layer in optics. MES possesses remarkable antireflective effects and plays a big role in optoelectronic applications. The wafer-level MES achieved using chemical etching with metal catalyst has been demonstrated. The method proposed in this paper provided a rapid and simple fabrication and could be integrated with current fabrication of solar cells and light-emitted devices (LED). © 2007 IEEE.
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Hsieh, C. M., Chyan, J. Y., Hsu, W. C., & Yen, J. A. (2007). Fabrication of wafer-level antireflective structures in optoelectronic applications. In 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS (pp. 185–186). https://doi.org/10.1109/OMEMS.2007.4373902
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