Characterization of hot-electron effects on flicker noise in III-V nitride based heterojunctions

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Abstract

We report experiments on hot-electron stressing in commercial III-V nitride based heterojunction light-emitting diodes. Stressing currents ranging from 100 mA to 200 mA were used. Degradations in the device properties were investigated through detailed studies of the I-V characteristics, electroluminescence, Deep-Level Transient Fourier Spectroscopy and flicker noise. Our experimental data demonstrated significant distortions in the I-V characteristics. The room temperature electroluminescence of the devices exhibited 25% decrement in the peak emission intensity. Concentration of the deep-levels was examined by measuring the Deep-Level Transient Fourier Spectroscopy, which indicated an increase in the density of deep-traps from 2.7 × 1013 cm -3 to 4.21 × 1013 cm-3 at E1 = EC - 1.1eV. The result is consistent with our study of 1/f noise, which exhibited up to three orders of magnitude increase in the voltage noise power spectra. Our experiments show large increase in both the interface traps and deep-levels resulted from hot-carrier stressing.

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Ho, W. Y., Fong, W. K., Surya, C., Tong, K. Y., Lu, L. W., & Ge, W. K. (1999). Characterization of hot-electron effects on flicker noise in III-V nitride based heterojunctions. In MRS Internet Journal of Nitride Semiconductor Research (Vol. 4). Materials Research Society. https://doi.org/10.1557/s1092578300003045

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