Maskless patterning of various kinds of metals onto porous silicon

Abstract

Position-selective electrodeposition of various kinds of metals onto porous silicon (PS) with laser illumination is investigated. Maskless patterning of not only Ni, Fe, and Zn, less noble metals, but also Cu, a noble metal, was achieved by suppressing the immersion plating with chloride ions. The photo-electrochemical behavior for each solution is compared. Similar results were obtained, especially in the cases of the less noble metals, indicating that the band structures of PS are in the similar condition. © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.