Patterning mesoscale gradient structures with self-assembled monolayers and scanning tunneling microscopy based replacement lithography

Abstract

Complex mesostructures showing gradient-type surface coverage with ω-substituted alkanthiols can be generated by STM replacement lithography. Variations of the replacement bias, lithographic scan rate, or raster line spacing create the gradient. The Figure shows an L-shaped gradient structure where Au(111) is separately thiol-covered in the corner, and highly covered on both ends.